Film Analysis: Thin Film Created In The 20th Century

Thin Film is first generated in the 20th Century. With the rapid development of resource and advance scientific knowledge on preparation, structure evolution and the properties of thin film, more advance and sophisticated thin film are created by preparation devices and method based on advances in vacuum technology[1]. Thin Film is a second generation of solar cells after silicon solar cells. This smart material reacts to temperature variations, electricity or magnetic fields or pressure variation since the late 1970’s but it’s only famous in small markets example calculator powered by amorphous silicon. Nowadays it is accessible in very large modules. This thin film was expected to make major advances in the market.

Thin film are prepared
This lead to questions and challenges at several levels of thoughts and to understand this oxides complex lies in the fabrication.

Vanadium dioxide is usually synthesized by means of Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), and sol-gel method. The synthesized method depends on the physical and chemical properties and stoichiometry. The film morphology is influenced by the phase transition characteristic. VO2+ are homologous series VnO2n−1 (3 ≤ n ≤ 9) also known as Magneli phases[5]. With careful choice of synthetic conditions is required to produce pure VO2 instead of other Vanadium
PVD are highly experimental that can be done in two method; sputtering and deposition which are mainly used for VO2 thin film synthesis. PVD ensures a clean and highly controllable synthesis which results is easily accessed with surface sensitive techniques. Sputter deposition is a technique to production thin film of VO2 based on impact of plasma ions on target, where the material is knocked out and deposited onto a support. This technique requires Oxygen as reactive gas to the sputter plasma in order to fully oxidized layers. Magnets are used to the back of the target the ionization in the plasma to enhanced, yielding more efficient sputter process (magnetron sputtering). This technique is used for coating flat substrate. Vacuum chamber is equipped with a rotating drum inside which sputter device are mounted. Combination of rotating container, it can equally serve to coat particle-like supports.

In 2009, Poelman et. Al conducted deposition of thin vanadia films on flat substrates which opens new pathways of investigating deposition film. The film does not suffer from reduction however; it gives a low surface area of a film that can never be use in a number of catalytic characterization techniques. To increase the surface area one extra step must be made by reducing the substrate particle size. With the rotating drum, vanadia dispersion, speciation and degree of polymerization