Reduction of Fluoride Waste Streams
Submitted by
Y. Smith
Prepared for
Dr. Alvarez
Webster University
09 May 2011
CERTIFICATE OF AUTHORSHIP: I certify that I am the author. I have cited all sources from which I used data, ideas, or words, either quoted directly or paraphrased. I also certify that this paper was prepared by me specifically for this course.
The Semiconductor Industry: Fluoride Waste Streams
Fluoride is a fairly common element that does not occur in the elemental state in nature because of its high reactivity, but it accounts for about 0.3 g/kg of the earth 's crust. Fluorides can be found in the waste streams of a number of industries to include “glass manufacturers, electroplating operations, steel and aluminum, pesticides and fertilizer, groundwater and the semiconductor industry” (Pham, 2010). Effluent levels, after treatment, can vary greatly so careful consideration needs to be given to its disposal for the fear that it may seep into our ground water or municipal water supplies. Fluoridation in the municipal water supplies is a controversial topic, specifically in water supplies. “Most of the modern industrial world has already tried and rejected fluoridation. Rationale for adding it to tap water has been a claimed but never really proven protection against dental caries” (Pham, 2010). In fact, Fluoride is considered to be a poison in most European countries. Industry, at large, creates waste streams, but I will discuss the fluoride waste streams generated from a Semiconductor Manufacturing plant.
What is a Semiconductor? According to the Merriam Webster Dictionary, a semiconductor is any of a class of solids whose electrical conductivity is between that of a conductor and that of an insulator in being nearly as great as that of a metal at high temperatures and nearly absent at low temperatures. Products in a typical semiconductor plant can include IC, VLSI, diode
References: (n.d.). Retrieved 04 26, 2011, from PPRC Web site: http://www.pprc.org/hubs/subsection.cfm?hub=1004&subsec=11&nav=11&CFID=3236048&CFTOKEN=29782418 Bue, L. S. (2005). Reduction of PFC Emissions: State-of-Technology Report 2005. Austin, TX: ISMI. Chion, C. F., Lee, M. S., Liao, C. C., Shao, H., & You, H. S. (1997). The Reclamation by Crystallization Technology for Semiconductor Fluoride-Containing Wastewater Treatment. Asian Pacific Regional Conference, 573-579. Chuang, T. C., Huang, C. J., & Liu, J. C. (2002). Treatment of Semiconductor Wastewater by Dissolved Air Flotation. Journal of Environmental Engineering, Vol. 128, No.10, 974-980. Jangbarwala, J., & Krulik, G. A. (2006). USA Patent No. WO/2005/065265. Kurosaki, H. (2008). Reduction of Fluorine-Containing Industrial Waste. Oki Technical Review, 53-56. Pham, T. (2010, January 14). Retrieved April 30, 2011, from Article Alley Website: http://www.articlealley.com/article_1345156_27.html?ktrack=kcplink