In the experiment, Silver nanoparticles is used as it has low absorption losses, compared to other metals. The formation of silver nanoparticles is done by depositing of various mass thickness of uniform layer of silver at the rate approximately 2 Å/ s at 1x10−5 Torr. After this, the sample were annealed in nitrogen for 50 min at 200 °C. The particle coalesce together to formed island due to surface tension.
In this experiment, four samples were used,
a) 1.25 µm SOI Test Cells – The thickness layer of SOI devices is to be 1248 nm for silicon layer and 1000 nm for buried oxide layer.
b) Planar PERL (Passivated Emitter Rear Locally Diffused) Si – This wafer was fabricated from a 1 Ωcm p-type float zone wafer and had n-type passivated emitter with metal fingers in the front and the contact to the p-type at the back, which likewise assumed the part of back reflector.
c) Double-sided Polished Si Wafers – This wafer has a thickness of 300 µm
d) Plain Glass – This sample is taken to discover the bare island resonance of the nanoparticles for a specific testimony.
Samples that were taken consist of top oxide layer of approximately 30 nm. Oxide …show more content…
In this plot, we observed that there is corresponding increase in current, 19% for 12nm silver, 14% for 14nm silver and 2% for 16nm silver respectively. The fact here is to be point out that we cannot see any drop in photocurrent enhancement factor below unity, in the entire range of wavelength above 500 nm. Now this become important observation because if there is small reduction of photocurrent in this range would be compensated near Si band gap wavelength due to light trapping. As seen enhancement is more for large size particles as wavelength increases, i.e. close to the Si band gap. Also, smaller size particles shows the enhancement over the wavelength of 500nm, as in case of 12 nm thick silver